Abstract: Accès restreint aux membres de l'Université de Lorraine jusqu'au 2016-02-16; Copper oxide (Cu2O, Cu4O3 and CuO) thin films have been deposited on unmatched substrates by sputtering at room temperature. The influence of oxygen flow rate and total pressure on the film structure and preferred orientation has been studied. The total pressure is a relevant parameter to control the texture of Cu2O and Cu4O3 films, while the oxygen flow rate is effective to tune the preferred orientation of CuO films. Local epitaxial growth, where epitaxial relation...
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Topics: 
Composite material
Optoelectronics