@article{Fujihara_2004,<br/><span class="tab"></span> title={Fabrication of Porous Metal Oxide Semiconductor Films by a Self-Template Method Using Layered Hydroxide Metal Acetates},<br/><span class="tab"></span> volume={31},<br/><span class="tab"></span> ISSN={0928-0707},<br/><span class="tab"></span> url={http://dx.doi.org/10.1023/b:jsst.0000047980.69279.9b},<br/><span class="tab"></span> DOI={10.1023/b:jsst.0000047980.69279.9b},<br/><span class="tab"></span> number={1–3},<br/><span class="tab"></span> journal={Journal of Sol-Gel Science and Technology},<br/><span class="tab"></span> publisher={Springer Science and Business Media LLC},<br/><span class="tab"></span> author={Fujihara,<br/><span class="tab"></span> Shinobu and Hosono,<br/><span class="tab"></span> Eiji and Kimura,<br/><span class="tab"></span> Toshio},<br/><span class="tab"></span> year={2004},<br/><span class="tab"></span> month=aug,<br/><span class="tab"></span> pages={165–168} }